Preparation and Microstructure Characterization of MoS2 Added TiAlN/CrN
Multilayered Nanocrystalline Thin Films
D. BIRO, P.B. BARNA, T. HATTORI, A. DEVENYI, L.F. JAKAB, S. PAPP
Abstract. Nanocrystalline thin film coatings of MoS2-added CrN/TiAlN
multilayers were prepared by reactive d.c. co-sputtering of Ti/Al 50/50
at.%, pure chromium and MoS2 targets, used as sputter sources of the
unbalanced magnetrons. Structure characterization of the as-deposited
coatings was performed by cross sectional transmission electron microscopy
(TEM) analyses. The self-lubricated MoS2 doped multilayered TiAlN/CrN
films with a periodic thickness of 6 nm had smaller crystallite size than
the homogeneous Cr and CrN films. The crystallinity of the CrN and TiAlN
layers in the nano-scale multilayered system decreases with increasing
thickness of the MoS2 layer. It has been found that the structural
properties and hardness of the films were correlated with the multiple
target design and MoS2 nanolayer thickness. |