RF-MEMS MANUFACTURING PROCESS ON GaAs SUBSTRATE FULLY COMPATIBLE WITH
F. CHERUBINI, P. FARINELLI, A. OCERA, S. LAVANGA, L. VENTURELLI, C.
LANZIERI, A. CETRONIO, R. SORRENTINO
This paper presents the RFMicroElectro-Mechanical Systems (RF-MEMS)
fabrication process on GaAs substrate developed at Selex-SI GaAs foundry.
The process is fully compatible with standard MMICs and allows to realize
both capacitive and ohmic RF-MEMS switches. The manufacturing of switches
with very simple geometry showed promising results thus enabled the design
of new devices with a more complex structure. An electro-mechanical model
of such switches was carried out by using Coventorware. At the end of the
article RF measurements are shown.