RF-MEMS MANUFACTURING PROCESS ON GaAs SUBSTRATE FULLY COMPATIBLE WITH MMICs
F. CHERUBINI, P. FARINELLI, A. OCERA, S. LAVANGA, L. VENTURELLI, C. LANZIERI, A. CETRONIO, R. SORRENTINO

Abstract. This paper presents the RFMicroElectro-Mechanical Systems (RF-MEMS) fabrication process on GaAs substrate developed at Selex-SI GaAs foundry. The process is fully compatible with standard MMICs and allows to realize both capacitive and ohmic RF-MEMS switches. The manufacturing of switches with very simple geometry showed promising results thus enabled the design of new devices with a more complex structure. An electro-mechanical model of such switches was carried out by using Coventorware. At the end of the article RF measurements are shown.